Sirus T2 Benchtop RIE

sirus t2 bench top rie

The Sirus T2 RIE is a benchtop compact plasma etching system, designed to etch dielectrics and other films that require fluorine-based chemistries.

The small footprint and robust design make it ideal for the lab environment.


Processes have been developed for etching silicon, silicon dioxide, silicon nitride, quartz, polyimide, tantalum, tungsten, titanium tungsten and other materials that require profile control, high selectivity and good uiformity.   


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